Silicon Carbide nanocrystals have been proposed as a promising material for optoelectronic, biomedical imaging, or other diagnostic techniques. However,
their fabrication in efficient bottom-up processes typically requires more effort. The main motivation of this project is to develop a low-cost, scalable,
atmospheric pressure, plasma-based technique to produce small (less than 10 nm) nanocrystals of Silicon Carbide (SiC), suitable for photonic applications.
We are going to investigate the material at a deeper level in order to determine which sector might be interested in the specific SiC nanocrystal that will be
produced by our system. The potential sectors include: energy, medical, defense, and communication industries. Optoelectronics market growing by
consuming silicon carbide nanocrystal semiconductors because It has a variety of applications.
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